검색
검색 팝업 닫기

Ex) Article Title, Author, Keywords

Article

Research Paper

Journal of the Optical Society of Korea 2015; 19(6): 619-628

Published online December 25, 2015 https://doi.org/10.3807/JOSK.2015.19.6.619

Copyright © Optical Society of Korea.

Deterministic Estimation of Stripe Type Defects and Reconstruction of Mask Pattern in L/S Type Mask Inspection

Wooshik Kim1 and Min-Chul Park2

1Department of Information and Communication Engineering, Sejong University, Seoul 143-747, Korea; 2Sensor System Research Center, Korea Institute of Science and Technology, Seoul 136-791, Korea

Received: July 30, 2015; Revised: November 12, 2015; Accepted: November 23, 2015

Abstract

In this paper, we consider a method for estimating a stripe-type defect and the reconstruction of a defect-free L/S type mask used in lithography. Comparing diffraction patterns of defected and defect-free masks, we derive equations for the estimation of the location and size of the defect. We construct an analytical model for this problem and derive closed form equations to determine the location and size using phase retrieval problem solving techniques. Consequently, we develop an algorithm that determines a defect-free mask pattern. An example shows the validity of the equations.

Keywords: EUVL (Extreme ultraviolet lithography), Phase retrieval,

OCIS codes: 100.5070; 110.4235; 340.7480

Optical Society of Korea

Current Optics
and Photonics


Min-Kyo Seo,
Editor-in-chief

Share this article on :

  • line