Photonic multiblock structure with an optical-source-embedding block, and the optical field distributions for (a) a dipole with polarization P = (1, 0, 0) and (b) a dipole with polarization P = (0, 0, 1). The thicknesses of block #1, the cathode, block #2, the active block, block #3, and the anode are 70 nm, 8 nm, 31 nm, 38 nm, 157 nm, and 114 nm respectively, and their refractive indices (n + jk) are 1.88, 0.191 + 3.24j, 1.71, 1.84 + 0.00272j, 1.94, and 0.129 + 3.19j, respectively.|@|~(^,^)~|@|Bidirectional S-matrix representation of a photonic structure with an optical-source-embedding block: (a) schematic diagram of the source-embedded multiblock structure and (b) bidirectional S-matrix model.|@|~(^,^)~|@|Gibbs-induced error in the field distribution obtained without the sigma operator. (a) E_x and (b) |E| in free space.|@|~(^,^)~|@|Discrete Weyl representations of U_z (a) without the sigma filter, and (b) with the sigma filter. The sigma filter’s reduction of Gibbs-induced error is clearly observed in (b).|@|~(^,^)~|@|Reduction of the Gibbs-induced error in the field distribution with the sigma filter. (a) E_x and (b) |E| in free space.|@|~(^,^)~|@|3D optical dipole radiation in free space: (a) schematic and E_x field distributions, (b) without, and (c) with the sigma filter. 2D dipole radiation near a 40-nm-thick Ag film: (d) schematic and E_x field distributions. (e) without, and (f) with the sigma filter. A surface plasmon is observed in the back side of the Ag film.

Curr. Opt. Photon. 2021;5:597~605 https://doi.org/10.3807/COPP.2021.5.6.597